Fujifilm Launches Innovative EUV Resist and Developer
SHERIDAN, WYOMING – November 9, 2024 – Enhancing EUV Lithography Materials Production in Japan and South Korea
In a move set to revolutionize semiconductor manufacturing, FUJIFILM Corporation has announced the launch of its cutting-edge negative-tone resists and developer for EUV lithography. This technology is poised to become the cornerstone of advanced semiconductor manufacturing processes, paving the way for smaller, more powerful chips.
Fujifilm has earned its stripes in the industry as the pioneer behind the world's first NTI process, a negative development process that has been instrumental in miniaturizing semiconductor circuits using ArF lithography. With the introduction of its negative-tone EUV resist and EUV developer, Fujifilm continues to push the boundaries of miniaturization, optimizing circuit pattern formation for the next generation of semiconductors.